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On the interplay between electrical conductivity and Seebeck coefficient in ultra-narrow silicon nanowires

机译:关于电导率与塞贝克系数之间的相互作用   在超窄硅纳米线中

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摘要

We analyze the effect of low dimensionality on the electrical conductivity({\sigma}) and Seebeck coefficient (S) in ultra-narrow Si nanowires (NWs) byemploying atomistic considerations for the electronic structures and linearizedBoltzmann transport theory. We show that changes in the geometrical features ofthe NWs such as diameter and orientation, mostly affect {\sigma} and S in twoways: i) the distance of the band edges from the Fermi level ({\eta}F) changes,and ii) quantum confinement in some cases strongly affect the effective mass ofthe subbands, which influences the conductivity of the NWs and {\eta}F. Changesin eta_F cause exponential changes in {\sigma}, but linear changes in S. Sseems to be only weakly dependent on the curvature of the bands, the strengthof the scattering mechanisms, and the shape of the DOS(E) function, contrary tocurrent view. Our results indicate that low dimensionality has a strongerinfluence on {\sigma} than on S due to the stronger sensitivity of {\sigma} on{\eta}F. We identify cases where bandstructure engineering through confinementcan improve {\sigma} without significantly affecting S, which can result inpower factor improvements.
机译:通过对电子结构和线性化玻尔兹曼输运理论的考虑,我们分析了低维数对超窄硅纳米线(NWs)中电导率({\ sigma})和塞贝克系数(S)的影响。我们显示,NW的几何特征(例如直径和方向)的变化主要以两种方式影响{\ sigma}和S:i)带边缘距费米能级({\ eta} F)的距离变化,以及ii量子限制在某些情况下会强烈影响子带的有效质量,从而影响NW和{F} F的电导率。 eta_F的变化引起{\ sigma}的指数变化,但S.的线性变化似乎仅弱地取决于带的曲率,散射机制的强度和DOS(E)函数的形状,这与当前观点相反。我们的结果表明,低维度对{\ sigma}的影响比对S的影响更大,这是因为{\ sigma}对{\ eta} F的敏感性更高。我们确定了通过约束进行带结构工程可以改善{\ sigma}而不会显着影响S的情况,这可以导致功率因数的改善。

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